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System Development & Application
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3038-3042

Health status monitoring based on DKNPE for semiconductor etch processes

Zhang Cheng
Dai Xunian
Guo Qingxiu
Li Yuan
Research Center for Technical Process Fault Diagnosis & Safety, Shenyang University of Chemical Technology, Shenyang 110142, China

Abstract

Aiming at the fault detection in batch processes with nonlinear or multimodal characteristics, this paper proposed a health status monitoring based on DKNPE. First, it calculated the score matrix of the training data set using NPE method, which was named real scores. Then, it calculated the K-nearest neighbor mean of each sample in the training data set and projected the mean into the low-dimensional space to obtain the estimated score of the sample. Next, it established two new statistics to monitor of samples in DS and DRS respectively. Compared with traditional methods such as principal component analysis(PCA), fault detection based on K nearest neighbors(FD-KNN) and NPE, the results indicate the effectiveness of the proposed method in two numerical cases and semiconductor etch processes.

Foundation Support

国家自然科学基金资助项目(61490701,61673279)

Publish Information

DOI: 10.19734/j.issn.1001-3695.2019.06.0214
Publish at: Application Research of Computers Printed Article, Vol. 37, 2020 No. 10
Section: System Development & Application
Pages: 3038-3042
Serial Number: 1001-3695(2020)10-032-3038-05

Publish History

[2020-10-05] Printed Article

Cite This Article

张成, 戴絮年, 郭青秀, 等. 基于DKNPE方法半导体蚀刻过程健康状态监视 [J]. 计算机应用研究, 2020, 37 (10): 3038-3042. (Zhang Cheng, Dai Xunian, Guo Qingxiu, et al. Health status monitoring based on DKNPE for semiconductor etch processes [J]. Application Research of Computers, 2020, 37 (10): 3038-3042. )

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  • Application Research of Computers Monthly Journal
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Application Research of Computers, founded in 1984, is an academic journal of computing technology sponsored by Sichuan Institute of Computer Sciences under the Science and Technology Department of Sichuan Province.

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